The project will establish a metrological SEM by tracing measured dimension values to SI unit. Th...

Start Date

2011

End Date

2015

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Establishment of Metrological SEM and Dual-probe Metrological SPM

The SEMs are widely used in material and nanoscience research, semiconductor and MEMS manufacturing. So standard is required to ensure the consistency of measurement results. The aim of the project is to improving traceability system in nano-geometry structure. The project will establish a metrological SEM by tracing dimension measurement to the SI unit. The edge of the line width measured by SEM will be studied and compared with AFM.

The project will establish a metrological SEM by tracing measured dimension values to SI unit. The SEM is modified through combination of interferometers and nanostage.

The standard will provide an uncertainty of 10nm. The measured pitch is no less than 200 nm. The standard is used to calibrate standard artifacts, which will be used to calibrate magnification of SEM to ensure the value consistency.